Production and analysis of multiply-charged ions in the Cornell electron beam ion source
An Electron Beam Ion Source (EBIS) which produces multiply-charged ions to be used in atomic physics collision and other experiments has been designed and constructed. The source utilizes a conventional solenoid magnet to produce the magnetic field confining the externally launched electron beam. Some of the novel features of the source are: 1) drift tubes made from stainless steel mesh to improve pumping in the interaction region of the source, 2) the ionization region is pumped on by a 140 l/sec distributed sputter-ion pump which encloses this region, and 3) the axial trap supply voltages are controlled by an 8 bit microprocessor. The source has been working reliably for over a year. Low energy 300 - 800 qeV H-like ions (C/sup 5 +/), He-like ions (C/sup 4 +/, N/sup 5 +/, O/sup 6 +/) and multiply-charged ions of noble gases such as Ne/sup 6 +/ have been produced by 1.0 - 2.0 kV, 0.07 - 0.20 A electron beams. The pressure in the electron gun interaction and extraction regions of the source range from 2.0 - 5.0 x 10/sup -9/ Torr. The source is relatively simple and operates reliably and reproducibly, an attractive feature in atomic physics experimental arrangements.
- Research Organization:
- Cornell Univ., Ithaca, NY (USA)
- OSTI ID:
- 5754842
- Country of Publication:
- United States
- Language:
- English
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