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Heteroepitaxial YBa sub 2 Cu sub 3 O sub 7 minus x -SrTiO sub 3 -YBa sub 2 Cu sub 3 O sub 7 minus x trilayers examined by transmission electron microscopy

Journal Article · · Applied Physics Letters; (USA)
DOI:https://doi.org/10.1063/1.104541· OSTI ID:5735835
;  [1]; ; ;  [2]
  1. Department of Materials Science and Mineral Engineering, University of California, Berkeley (USA) National Center for Electron Microscopy, Materials Sciences Division, Lawrence Berkeley Laboratory, Berkeley, California 94720 (USA)
  2. Department of Physics, University of California, Berkeley (USA) Center for Advanced Materials, Materials Sciences Division, Lawrence Berkeley Laboratory, Berkeley, California 94720 (USA)

We report high-resolution transmission electron microscopy and electron diffraction studies of the heteroepitaxial superconductor-insulator-superconductor system YBa{sub 2}Cu{sub 3}O{sub 7{minus}{ital x}}-SrTiO{sub 3}-YBa{sub 2}Cu{sub 3}O{sub 7{minus}{ital x}} deposited on polished (001)MgO substrates by {ital in} {ital situ} laser ablation. The resulting films grow epitaxially and consistently preserve a parallel orientation between the close-packed (001)YBa{sub 2}Cu{sub 3}O{sub 7{minus}{ital x}} planes and (001)SrTiO{sub 3} planes over the entire trilayer, even in the presence of ledges or steps along vicinal interfaces. Although the interface regions showed strain occasionally relieved by stacking faults, they were free of disorder and any evidence of impurity phases. The observed epitaxial growth is very likely responsible for the excellent electrical properties found in similarly constructed multilayer interconnects.

DOE Contract Number:
AC03-76SF00098
OSTI ID:
5735835
Journal Information:
Applied Physics Letters; (USA), Journal Name: Applied Physics Letters; (USA) Vol. 58:7; ISSN APPLA; ISSN 0003-6951
Country of Publication:
United States
Language:
English

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