Reactive ion etching of lead zirconate titanate (PZT) thin film capacitors
- Virginia Polytechnic Inst. and State Univ., Blacksburg, VA (United States). Dept. of Materials Science and Engineering
One of the key processing concerns in the integration of PbZr[sub x]Ti[sub 1[minus]x]O[sub 3](PZT) thin film capacitors into the existing VLSI for ferroelectric or dynamic random access memory applications is the patterning of these films and the electrodes. In this work, the authors have identified a suitable etch gas (CCl[sub 2]F[sub 2]) for dry etching of PZT thin films on RuO[sub 2] electrodes. The etch rate and anisotropy have been studied as a function of etching conditions. The trends in the effect on the etch rate of the gas pressure, RF power and O[sub 2] additions to the etch gas have been determined and an etching mechanism has been proposed. It was found that ion bombardment effects are primarily responsible for the etching of both PZT and RuO[sub 2] thin films. Etch rates of the order of 20--30 nm/min were obtained for PZT thin films under low gas pressure and high RF power conditions. The etch residues and the relative etch rates of the components of the PZT solid solution were determined using XPS. The results show that the etching of PbO is the limiting factor in the etch process.
- OSTI ID:
- 5727795
- Journal Information:
- Journal of the Electrochemical Society; (United States), Journal Name: Journal of the Electrochemical Society; (United States) Vol. 140:9; ISSN JESOAN; ISSN 0013-4651
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
CAPACITORS
CHALCOGENIDES
CHLOROFLUOROCARBONS
DISPERSIONS
ELECTRICAL EQUIPMENT
ELECTRODES
ELECTRONIC CIRCUITS
EQUIPMENT
ETCHING
INTEGRATED CIRCUITS
LEAD COMPOUNDS
LEAD OXIDES
MICROELECTRONIC CIRCUITS
MIXTURES
ORGANIC CHLORINE COMPOUNDS
ORGANIC COMPOUNDS
ORGANIC FLUORINE COMPOUNDS
ORGANIC HALOGEN COMPOUNDS
OXIDES
OXYGEN COMPOUNDS
PZT
REFRACTORY METAL COMPOUNDS
RUTHENIUM COMPOUNDS
RUTHENIUM OXIDES
SOLID SOLUTIONS
SOLUTIONS
SURFACE FINISHING
TITANATES
TITANIUM COMPOUNDS
TITANIUM OXIDES
TRANSITION ELEMENT COMPOUNDS
ZIRCONATES
ZIRCONIUM COMPOUNDS
ZIRCONIUM OXIDES