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Electrothermal vaporization for sample introduction into a three-electrode direct current argon plasma

Journal Article · · Anal. Chem.; (United States)
DOI:https://doi.org/10.1021/ac00297a067· OSTI ID:5699681

The direct current plasma (DCP) configuration developed by Elliott has been shown to be an excellent source for analytical atomic emission spectrometry. The application of DCP excitation for atomic emission (AES) measurements of trace metals has, during the past 10 years, enhanced the versatility of AES as an analytical technique. In normal use, sample is pumped continuously into a ceramic cross-flow nebulizer, and the resulting aerosol is transported to the excitation region of the plasma. This approach is satisfactory for routine analyses, but under special circumstances benefits may be obtained from the use of electrothermal vaporization (ETV) sample introduction. In this study the adaptation of the commercial electrothermal vaporization system is explored for sample introduction into the three-electrode DCP. The ETV technique reduces the sample volume required for analysis and is especially convenient for volumes in the 5-20 ..mu..L range. Recent studies of aerosol approaching the plasma indicate that elimination of the solvent by ETV may permit more efficient introduction of the sample directly into the excitation region of the DCP than with conventional nebulization. Three elements chosen for this feasibility investigation (aluminum, copper, and manganese) cover a range of vaporization and excitation conditions and illustrate problems expected in analytical applications. For each element the effects of carrier gas flow rate and observation region were investigated using 1 ..mu..g/mL solutions. The conditions providing the best signal-to-background ratio were employed to measure the calibration function and estimate the detection limit. 8 references, 4 figures, 1 table.

Research Organization:
Univ. of Massachusetts, Amherst
OSTI ID:
5699681
Journal Information:
Anal. Chem.; (United States), Journal Name: Anal. Chem.; (United States) Vol. 58:6; ISSN ANCHA
Country of Publication:
United States
Language:
English