Diamondlike carbon films - optical absorption, dielectric properties, and hardness dependence on deposition parameters

Conference · Sat Jun 01 00:00:00 EDT 1985 · J. Vac. Sci. Technol., A; (United States)

OSTI ID:5699430

Natarajan, V; Lamb, J D; Woollam, J A; Liu, D C; Gulino, D A

An RF plasma deposition system was used to prepare amorphous diamondlike carbon films. The source gases for the RF system include methane, ethylene, propane, and propylene, and the parameters varied were power, dc substrate bias, and postdeposition anneal temperature. Films were deposited on various substrates. The main diagnostics were optical absorption in the visible and in the infrared, admittance as a function of frequency, hardness, and Auger and ESCA spectroscopy. Band gap is found to depend strongly on RF power level and band gaps up to 2.7 eV and hardness up to 7 Mohs were found. There appears to be an inverse relationship between hardness and optical band gap. 12 references.

• Research Organization: Nebraska Univ., Lincoln; NASA, Lewis Research Center, Cleveland, OH
• OSTI ID: 5699430
• Report Number(s): CONF-841218-
• Journal Information: J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 3; ISSN JVTAD
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360601* -- Other Materials-- Preparation & Manufacture
AMORPHOUS STATE
ANNEALING
CARBON
DEPOSITION
DIAMONDS
ELECTRICAL PROPERTIES
ELEMENTAL MINERALS
ELEMENTS
FILMS
HEAT TREATMENTS
HYDROCARBONS
MINERALS
NONMETALS
OPTICAL PROPERTIES
ORGANIC COMPOUNDS
PHYSICAL PROPERTIES
PLASMA ARC SPRAYING
SPRAY COATING
SURFACE COATING
THIN FILMS