Apparatus for focus-deflecting a charged particle beam
Patent
·
OSTI ID:5699355
The apparatus for focus-deflecting a charged particle beam includes two electron lenses for focusing the charged particle beam and a single deflector for deflecting the charged particle beam to a desired position, wherein one of the electron lenses on the object point side and the deflector are arranged so that their magnetic fields overlap each other, and the aberration generated by them offsets that generated by the other of the electron lenses.
- Assignee:
- Hitachi Ltd. (Japan)
- Patent Number(s):
- US 4475044
- OSTI ID:
- 5699355
- Country of Publication:
- United States
- Language:
- English
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