Spatial dependence of composition in ion beam sputter deposited GdTbFe thin films

Journal Article · Wed May 01 04:00:00 EDT 1991 · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA)

DOI:https://doi.org/10.1116/1.577374· OSTI ID:5692619

Shah, S I; Carcia, P F ^[1]

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1. Central Research and Development Department Experimental Station, E. I. du Pont de Nemours and Company, P.O. Box 80356, Wilmington, Delaware 19880-0356 (USA)

We measured the spatial dependence of chemical composition of ion beam sputtered GdTbFe thin films, which is the recording medium in an erasable magneto-optical disk. We found that films were enriched in Fe, relative to the target composition, directly underneath the target and became increasingly Fe rich as the Ar{sup +} ion energy decreased. We ascribe this characteristic at low incident ion energies to a mass-related sputtering effect, in which the lighter element (Fe) is preferentially sputtered normal to the target surface. At higher incident ion energies we examined the contribution to spatial inhomogeneity from resputtering of Gd and Tb at the growing film by energetic reflected neutrals.

• OSTI ID: 5692619
• Journal Information: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA) Vol. 9:3; ISSN JVTAD; ISSN 0734-2101
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360104* -- Metals & Alloys-- Physical Properties
ALLOYS
AMORPHOUS STATE
BEAMS
CHEMICAL COMPOSITION
DISTRIBUTION
FILMS
GADOLINIUM ALLOYS
HIGH VACUUM
ION BEAMS
IRON ALLOYS
RARE EARTH ALLOYS
SPATIAL DISTRIBUTION
SPUTTERING
TERBIUM ALLOYS
THIN FILMS