Laser diagnostic studies of plasma etching and deposition. [CF/sub 2/]
Conference
·
OSTI ID:5692170
Laser excited fluorescence spectroscopy was used to determine that CF/sub 2/ radicals control the silicon dioxide to silicon etch-rate ratio in fluorocarbon discharges used to etch silicon and silicon dioxide. CF/sub 2/ was found to control the etch-rate ratio through polymer formation which selectively inhibits the silicon etch rate. 9 refs., 4 figs.
- Research Organization:
- Sandia National Labs., Albuquerque, NM (USA)
- DOE Contract Number:
- AC04-76DP00789
- OSTI ID:
- 5692170
- Report Number(s):
- SAND-85-0082C; CONF-840761-2; ON: DE85009494
- Resource Relation:
- Conference: International conference on laser processing and diagnostics applications in electronic materials, Linz, Austria, 15 Jul 1984
- Country of Publication:
- United States
- Language:
- English
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OSTI ID:5692170
Related Subjects
36 MATERIALS SCIENCE
37 INORGANIC
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
CARBON FLUORIDES
LASER SPECTROSCOPY
GLOW DISCHARGES
DIAGNOSTIC TECHNIQUES
RADICALS
SILICON
ETCHING
SILICON OXIDES
DENSITY
EXPERIMENTAL DATA
FLUORESCENCE SPECTROSCOPY
GROUND STATES
PLASMA
QUANTITY RATIO
CARBON COMPOUNDS
CHALCOGENIDES
DATA
ELECTRIC DISCHARGES
ELEMENTS
EMISSION SPECTROSCOPY
ENERGY LEVELS
FLUORIDES
FLUORINE COMPOUNDS
HALIDES
HALOGEN COMPOUNDS
INFORMATION
NUMERICAL DATA
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
SEMIMETALS
SILICON COMPOUNDS
SPECTROSCOPY
SURFACE FINISHING
360604* - Materials- Corrosion
Erosion
& Degradation
400104 - Spectral Procedures- (-1987)
700102 - Fusion Energy- Plasma Research- Diagnostics
37 INORGANIC
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
CARBON FLUORIDES
LASER SPECTROSCOPY
GLOW DISCHARGES
DIAGNOSTIC TECHNIQUES
RADICALS
SILICON
ETCHING
SILICON OXIDES
DENSITY
EXPERIMENTAL DATA
FLUORESCENCE SPECTROSCOPY
GROUND STATES
PLASMA
QUANTITY RATIO
CARBON COMPOUNDS
CHALCOGENIDES
DATA
ELECTRIC DISCHARGES
ELEMENTS
EMISSION SPECTROSCOPY
ENERGY LEVELS
FLUORIDES
FLUORINE COMPOUNDS
HALIDES
HALOGEN COMPOUNDS
INFORMATION
NUMERICAL DATA
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
SEMIMETALS
SILICON COMPOUNDS
SPECTROSCOPY
SURFACE FINISHING
360604* - Materials- Corrosion
Erosion
& Degradation
400104 - Spectral Procedures- (-1987)
700102 - Fusion Energy- Plasma Research- Diagnostics