Effects of cesium in the plasma of the surface conversion H/sup -/ source

Journal Article · Thu Mar 01 04:00:00 EST 1984 · AIP Conf. Proc.; (United States)

DOI:https://doi.org/10.1063/1.34422· OSTI ID:5679681

Ehlers, K W; Leung, K N

The usual method for replacing the partial monolayer of cesium which is removed by sputtering from the surface of the converter electrode of a surface production negative ion source, is to allow cesium atoms to condense or adsorb onto this surface. While this method is easily employed for short pulsed source operation, it becomes increasingly difficult in the dc case because of the high probability of ionization of the cesium atoms as they pass through the discharge. In this paper, we attempt to analyse the severity of this problem in which cesium arrives at the converter surface as an energetic ion rather than as a thermal atom.

• Research Organization: Lawrence Berkeley Laboratory, University of California, Berkeley, California 94720
• DOE Contract Number: AC03-76SF00098
• OSTI ID: 5679681
• Report Number(s): CONF-831180-
• Journal Information: AIP Conf. Proc.; (United States), Journal Name: AIP Conf. Proc.; (United States) Vol. 111:1; ISSN APCPC
• Country of Publication: United States
• Language: English

Related Subjects

640301* -- Atomic
Molecular & Chemical Physics-- Beams & their Reactions
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ALKALI METALS
ANIONS
CESIUM
CHARGED PARTICLES
COVERINGS
CROSS SECTIONS
DATA
ELECTRIC DISCHARGES
ELECTRODES
ELEMENTS
EXPERIMENTAL DATA
HYDROGEN IONS
HYDROGEN IONS 1 MINUS
INFORMATION
ION SOURCES
IONIZATION
IONS
METALS
NUMERICAL DATA
OPERATION
PERFORMANCE
PULSES
SPUTTERING