Langmuir probe characteristics in RF glow discharges

Journal Article · Mon Feb 29 23:00:00 EST 1988 · Plasma Chemistry and Plasma Processing; (USA)

DOI:https://doi.org/10.1007/BF01016929· OSTI ID:5646605

Hershkowitz, N; Cho, M H; Nam, C H; Intrator, T ^[1]

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1. Univ. of Wisconsin, Madison (USA)

The current-voltage characteristics of Langmuir probes in rf glow discharges can be misinterpreted by the effects of rf time averaging, ionization near a probe, and expansion of the probe sheath. This paper presents a new Langmuir probe technique which can be used to determine the plasma parameters in rf glow discharges. Simple expressions for the time averaged I-V characteristics are derived for the cases of fully sinusoidal and partially rectified plasma potential waveforms. Examples of corresponding I-V characteristics obtained from argon rf glow discharges are also illustrated.

• DOE Contract Number: AC02-78ET51015
• OSTI ID: 5646605
• Journal Information: Plasma Chemistry and Plasma Processing; (USA), Journal Name: Plasma Chemistry and Plasma Processing; (USA) Vol. 8:1; ISSN PCPPD; ISSN 0272-4324
• Country of Publication: United States
• Language: English

Related Subjects

440300* -- Miscellaneous Instruments-- (-1989)
47 OTHER INSTRUMENTATION
ARGON
BESSEL FUNCTIONS
ELECTRIC CONDUCTIVITY
ELECTRIC DISCHARGES
ELECTRIC POTENTIAL
ELECTRIC PROBES
ELECTRICAL PROPERTIES
ELECTRON DENSITY
ELECTRON TEMPERATURE
ELECTRONS
ELEMENTARY PARTICLES
ELEMENTS
FERMIONS
FLUIDS
FUNCTIONS
GASES
GLOW DISCHARGES
HIGH-FREQUENCY DISCHARGES
LANGMUIR PROBE
LEPTONS
NONMETALS
PERFORMANCE
PHYSICAL PROPERTIES
PLASMA DIAGNOSTICS
PROBES
RARE GASES
SENSITIVITY
SPUTTERING
WAVE FORMS