skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Analysis of pseudomorphic GaAs/InGaAs/AlGaAs modulation-doped field-effect transistor structures by secondary-ion mass spectrometry and ion channeling

Journal Article · · Applied Physics Letters; (USA)
DOI:https://doi.org/10.1063/1.104344· OSTI ID:5633996
 [1];  [2];  [3]
  1. Center for Advanced Materials, Materials Science Division, Lawrence Berkeley Laboratory, 1 Cyclotron Road, Berkeley, California 94720 (US)
  2. Charles Evans Associates, 301 Chesapeake Drive, Redwood City, California 94063 (USA)
  3. Center for Advanced Materials, Materials Science Division, Lawrence Berkeley Laboratory, 1 Cyclotron Road, Berkeley, California 94720 (USA)

Secondary-ion mass spectrometry has been used to analyze the Al and In depth profiles in pseudomorphic GaAs/InGaAs/AlGaAs modulation-doped field-effect transistor structures. Surface segregation of In was found on the upper interface of the strained InGaAs layer under a moderate growth temperature of 510 {degree}C. The segregation effect was found to be suppressed when the As{sub 4} overpressure was doubled. Ion channeling measurements are capable of differentiating the coherency of the strained InGaAs layer in the samples studied. A correlation was found between the coherency of the layer and its electrical transport property.

DOE Contract Number:
AC03-76SF00098
OSTI ID:
5633996
Journal Information:
Applied Physics Letters; (USA), Vol. 58:12; ISSN 0003-6951
Country of Publication:
United States
Language:
English