High-rate ( similar to 50-A/s) deposition of ZnO films for amorphous silicon alloy solar-cell back-reflector application

Journal Article · Thu Aug 01 00:00:00 EDT 1991 · Journal of Applied Physics; (USA)

DOI:https://doi.org/10.1063/1.349538· OSTI ID:5627585

Banerjee, A; Wolf, D; Yang, J; Guha, S ^[1]

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1. United Solar Systems Corp., 1100 West Maple Road, Troy, Michigan 48084 (US)

Back reflectors have been fabricated by the deposition of ZnO films on textured Ag films. High deposition rates of {similar to}50 A/s have been achieved by the dc magnetron sputtering technique. The ZnO target used has been prepared in our laboratory. Amorphous silicon alloy solar cells have been deposited on the ZnO/textured Ag back reflector. Control samples have been prepared by the deposition of identical cells on the same back reflector, but in which the ZnO films have been prepared by a low-rate {similar to}5-A/s rf sputtering process. The short-circuit current density, which has been used as the primary test parameter for evaluating the back reflectors, is slightly superior in the case of the high-rate ZnO back reflector. The high-rate deposition process is, therefore, attractive for large-volume production application.

• OSTI ID: 5627585
• Journal Information: Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 70:3; ISSN 0021-8979; ISSN JAPIA
• Country of Publication: United States
• Language: English

Related Subjects

14 SOLAR ENERGY
140501* -- Solar Energy Conversion-- Photovoltaic Conversion
CHALCOGENIDES
DEPOSITION
DIRECT ENERGY CONVERTERS
EQUIPMENT
FABRICATION
FILMS
OXIDES
OXYGEN COMPOUNDS
PHOTOELECTRIC CELLS
PHOTOELECTRIC EFFECT
PHOTOELECTROMAGNETIC EFFECTS
PHOTOVOLTAIC CELLS
SILICON SOLAR CELLS
SOLAR CELLS
SOLAR EQUIPMENT
SPUTTERING
THIN FILMS
ZINC COMPOUNDS
ZINC OXIDES