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Effect of post-deposition annealing on structure and chemistry of the TiN film/steel substrate interfaces

Journal Article · · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA)
DOI:https://doi.org/10.1116/1.577429· OSTI ID:5623826
 [1];  [2]
  1. Materials and Components Technology Division, Argonne National Laboratory, Argonne, Illinois 60439 (USA)
  2. Inland Steel Company, East Chicago, Indiana 46213 (USA)
This study deals with solid-state phase transformations occurring at interfaces between a TiN film and an AISI M50 steel substrate during postdeposition annealing at 500 and 1000 {degree}C. Cross-sectional transmission electron microscopy (XTEM) was used to investigate the nature of phase transformations at these interfaces. The TiN films were ion plated onto M50 steel with an initial Ti underlayer at 100 {degree}C. XTEM and electron energy loss spectroscopy of the interfaces indicated that the ion-plated Ti underlayers transformed into a TiC phase during annealing at 500 {degree}C and into a Ti(C,N) phase during annealing at 1000 {degree}C. In addition, the density of defects within grains was significantly reduced during annealing and the grains themselves became larger.
Research Organization:
Argonne National Laboratory (ANL), Argonne, IL
DOE Contract Number:
W-31109-ENG-38
OSTI ID:
5623826
Journal Information:
Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA) Vol. 9:3; ISSN JVTAD; ISSN 0734-2101
Country of Publication:
United States
Language:
English