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Fermi level effects on dislocation formation in InAs sub 1-x Sb sub x grown by MOCVD

Conference ·
OSTI ID:5619694

Dislocation formation in InAs{sub 1-x}Sb{sub x} buffer layers grown by metal-organic chemical vapor deposition is shown to be reproducibly enhanced by p-type doping at levels greater than or equal to the intrinsic carrier concentration at the growth temperature. To achieve a carrier concentration greater than 2 {times} 10{sup 18} cm{sup {minus}3}, the intrinsic carrier concentration of InSb at 475 C, p-type doping with diethylzinc was used. Carrier concentrations up to 6 {times} 10{sup 18} cm{sup {minus}3} were obtained. The zinc doped buffer layers have proven to be reproducibly crack free for InAs{sub 1-x}Sb{sub x} step graded buffer layers with a final composition of x = 0.12 and a strained layer superlattice with an average composition of x = 0.09. These buffer layers have been used to prepare SLS infrared photodiodes. The details of the buffer layer growth, an explanation for the observed Fermi level effect and the growth and characterization of an infrared photodiode are discussed.

Research Organization:
Sandia National Labs., Albuquerque, NM (United States)
Sponsoring Organization:
DOE; USDOE, Washington, DC (United States)
DOE Contract Number:
AC04-76DP00789
OSTI ID:
5619694
Report Number(s):
SAND-91-1561C; CONF-911202--64; ON: DE92008332
Country of Publication:
United States
Language:
English