Continuous vacuum processing system for quartz crystal resonators

Conference · Mon Jan 01 04:00:00 EST 1979

DOI:https://doi.org/10.1109/FREQ.1979.200341· OSTI ID:5618917

Ney, R. J.; Hafner, E.

An ultrahigh vacuum continuous cycle quartz crystal fabrication facility has been developed that assures an essentially contamination-free environment throughout the final manufacturing steps of the crystal unit. The system consists of five essentially tubular vacuum chambers that are interconnected through gate valves. The unplated crystal resonators, mounted in ceramic flatback frames and loaded on carrier trays, enter the vacuum system through an entrance air lock, are UV/ozone cleaned, baked at 300/sup 0/C, plated to frequency, thermocompression sealed, and exit as completed crystal units through an exit air lock, while the bake, plate and seal chambers remain under continuous vacuum permanently. In-line conveyor belts are used, in conjunction with balanced vacuum manipulators, to move the resonator components to the various work stations. Unique high density, highly directional nozzle beam evaporation sources, capable of long term operation without reloading, are used for electroding the resonators simultaneously on both sides. The design goal for the system is a production rate of 200 units per 8 hour day; it is adaptable to automatic operation.

• Research Organization: General Electric Co., St. Petersburg, FL (USA). Neutron Devices Dept.; Army Electronics Technology and Devices Lab., Fort Monmouth, NJ (USA)
• DOE Contract Number: EY-76-C-04-0656
• OSTI ID: 5618917
• Report Number(s): GEPP-OP-439; CONF-790554-2
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
420700 -- Engineering-- Vacuum Engineering-- (-1987)
420800* -- Engineering-- Electronic Circuits & Devices-- (-1989)
CHALCOGENIDES
CRYSTALS
DESIGN
ELECTRONIC EQUIPMENT
FABRICATION
OPERATION
OXIDES
OXYGEN COMPOUNDS
QUARTZ
RESONATORS
SEALING MATERIALS
SILICON COMPOUNDS
SILICON OXIDES
ULTRAHIGH VACUUM
VACUUM SYSTEMS