Quartz crystal fabrication facility. First semiannual report, October 1976--March 1977

Technical Report · Tue Nov 01 04:00:00 EST 1977

DOI:https://doi.org/10.2172/5003393· OSTI ID:5003393

Frank, J. M.; Ney, R. J.

The specification objectives for a high production, in line, ultrahigh vacuum, precision crystal unit final processing system now being constructed are reviewed. Design features of the system including methods for ultraviolet cleaning, bakeout, plating and sealing of crystal units having ceramic flat pack enclosures in an oil-free, cryogenic vacuum system are outlined. Entrance and exit air lock chambers and transports provide means to maintain the critical process chambers at high vacuum continuously. Experimentation to develop and prove several process modules being incorporated into the final system is described and initial results reported. Emphasis is placed on simplicity of design, operational reliability, modular interchangeability, cleanliness, and future automation aspects.

• Research Organization: General Electric Co., St. Petersburg, Fla. (USA). Neutron Devices Dept.
• OSTI ID: 5003393
• Report Number(s): GEPP-309
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360601* -- Other Materials-- Preparation & Manufacture
CHALCOGENIDES
CRYSTAL GROWTH
DESIGN
FABRICATION
LOW TEMPERATURE
OXIDES
OXYGEN COMPOUNDS
PERFORMANCE
QUARTZ
SILICON COMPOUNDS
SILICON OXIDES
VACUUM SYSTEMS