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Raman-scattering and optical studies of argon-etched GaAs surfaces

Journal Article · · Physical Review, B: Condensed Matter; (USA)
;  [1]; ;  [2]
  1. Department of Physics, Virginia Tech, Blacksburg, Virginia 24061 (USa)
  2. Department of Chemistry, Virginia Tech, Blacksburg, Virginia 24061 (USA)
We have studied the structual damage in low-energy argon-ion-bombarded (ion-etched) GaAs using Raman scattering and ultraviolet reflectivity. When combined with post-bombardment sequential chemical etching, the Raman results reveal a graded depth profile of the damage layer, with a nearly linear damage dropoff with depth. The total damage-layer thickness is about 600 A for high-fluence bombardment with 3.89-keV Ar{sup +} ions. The spectral effects produced by argon etching are very different from those produced by high-energy ion implantation. The longitudinal-optic Raman line seen for argon-etched GaAs is not shifted and broadened as in ion-implanted GaAs. More striking are the results of the reflectivity measurements. For argon-etched GaAs, the electronic interband peaks are both broadened and strongly red shifted relative to the crystal peaks; for ion-implanted GaAs, only the broadening occurs. Distinct nanocrystals, which account for the effects seen in ion-implanted GaAs, are evidently absent in argon-etched GaAs. Instead, the damage layer caused by argon etching appears to be characterized by a very high density of point defects, which previous work suggests may be arsenic vacancies.
OSTI ID:
5615896
Journal Information:
Physical Review, B: Condensed Matter; (USA), Journal Name: Physical Review, B: Condensed Matter; (USA) Vol. 43:12; ISSN 0163-1829; ISSN PRBMD
Country of Publication:
United States
Language:
English