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Properties of NbN thin films deposited on ambient temperature substrates

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.331881· OSTI ID:5598406
The preparation of cubic NbN films by reactive dc magnetron sputtering is described. These superconductive films are deposited at a sufficiently low temperature (<90 /sup 0/C) that photoresist liftoff techniques and can be used in fabricating Josephson junctions. The superconducting transition temperature has been measured as a function of gas composition and pressure. It reaches a maximum of 14.2 K at 15% N/sub 2/--85% Ar and 1.06 Pa total pressure. The resistivity ratio of these films is close to unity. Structural studies by transmission electron microscopy and electron diffraction show that films 100-nm thick or less are randomly oriented, and noncolumnar with a crystallite diameter of 5 nm and a lattice parameter of 4.46 A, which is significantly higher than the bulk value for cubic NbN. The films are dense with void diameters no larger than 0.7 nm. Films 300-400 nm thick show a small degree of texturing in x-ray studies with a Read camera. Auger analysis shows a monotonic increase in the N/Nb ratio with increase in the N/sub 2//Ar ratio in the sputtering ambient up to 30% N/sub 2/. From 30% to 50% N/sub 2/ in the sputtering mixture the N/Nb ratio is constant. Small amounts of carbon impurity are found in all films.
Research Organization:
Bell Laboratories, Murray Hill, New Jersey 07974
OSTI ID:
5598406
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 54:11; ISSN JAPIA
Country of Publication:
United States
Language:
English

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