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Associative and dissociative electron attachment by SF/sub 6/ and SF/sub 5/Cl

Journal Article · · J. Chem. Phys.; (United States)
OSTI ID:5595367

Electron attachment by SF/sub 6/ and SF/sub 5/Cl in the energy range 0--20 eV has been studied in a beam experiment at room temperature. At low energies (approx. =0 eV) electron attachment to SF/sub 6/ yields the well known parent anion SF/sup -//sup *//sub 6/ (associative attachment) and SF/sup -//sub 5/ (dissociative attachment), while other negative ion fragments (F/sup -/, F/sup -//sub 2/ , SF/sup -//sub 2/ , SF/sup -//sub 3/ , and SF/sup -//sub 4/) are generated with comparably low cross sections from various resonances at higher energies. In contrast to that, negative ion formation in SF/sub 5/Cl is dominated by dissociative channels (F/sup -/, Cl/sup -/, FCl/sup -/, and SF/sup -//sub 5/ ) and only a weak SF/sub 5/Cl/sup -/ signal is observed. A time-of-flight analysis of the ionic fragments reveals that the decomposition of all resonances is characterized by a low translational excess energy release indicating effective energy randomization in the parent ion prior to dissociation. The present results are compared with negative ion formation in halogenated hydrocarbons.

Research Organization:
Institut fuer Physikalische und Theoretische Chemie der Freien Universitaet Berlin, Takustrasse 3, D-1000 Berlin 33, West Germany
OSTI ID:
5595367
Journal Information:
J. Chem. Phys.; (United States), Journal Name: J. Chem. Phys.; (United States) Vol. 88:1; ISSN JCPSA
Country of Publication:
United States
Language:
English