Narrow double-current-confinement channeled-substrate planar laser fabricated by double etching technique

Journal Article · Tue Apr 15 04:00:00 EST 1980 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.91606· OSTI ID:5587036

Chen, C; Wang, S

The double-current-confinement channeled-substrate planar (DCC-CSP) laser, fabricated by the newly developed double etching technique, with channel width smaller than carrier diffusion length is demonstrated. In the majority of the 2-..mu..m DCC-CSP lasers tested, linear light-current relation and stable fundamental-mode operation have been uniformly observed over the range of current tested (up to 3--5J/sub th/). The lasers operate in single longitudinal mode with fixed emission wavelength up to 2.2J/sub th/. The narrow-channel DCC structure offers a method to relax the stringent design tolerance in the conventional CSP laser.

• Research Organization: Department of Electrical Engineering and Computer Sciences and the Electronics Research Laboratory, University of California, Berkeley, California 94720
• OSTI ID: 5587036
• Journal Information: Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 36:8; ISSN APPLA
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
ALUMINIUM ARSENIDES
ALUMINIUM COMPOUNDS
ARSENIC COMPOUNDS
ARSENIDES
CHANNELING
CHARGE CARRIERS
CURRENTS
DATA
DIFFUSION LENGTH
ELECTRIC CURRENTS
ETCHING
FABRICATION
GALLIUM ARSENIDES
GALLIUM COMPOUNDS
INFORMATION
LASERS
OSCILLATION MODES
PNICTIDES
SEMICONDUCTOR DEVICES
SEMICONDUCTOR LASERS
SUBSTRATES
SURFACE FINISHING