Reaction of atomic fluorine with silicon: The gas phase products

Journal Article · Sat May 01 00:00:00 EDT 1982 · J. Appl. Phys.; (United States)

DOI:https://doi.org/10.1063/1.331122· OSTI ID:5584430

Vasile, M J; Stevie, F A

SiF/sub 2/ and SiF/sub 4/ have been identified as gas phase products of the reaction between atomic fluorine and silicon. Atomic fluorine is supplied by a low density molecular beam hitting a silicon target in a high vacuum. Reaction products were detected by mass spectrometric measurements. Activation energies for the production of SiF/sub 2/ and SiF/sub 4/ were found to be 0.09 +- 0.02 and 0.15 +- 0.02 eV//sup 0/K, respectively, in good agreement with the values measured by flowing afterglow techniques. The reaction probability for the reaction 4F+Si..-->..SiF/sub 4/ was found to be 0.016 at 100 /sup 0/C.

• Research Organization: Bell Laboratories, Murray Hill, New Jersey 07974
• OSTI ID: 5584430
• Journal Information: J. Appl. Phys.; (United States), Vol. 53:5
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
FLUORINE
CHEMICAL REACTIONS
SILICON
ACTIVATION ENERGY
ATOMS
DENSITY
EXPERIMENTAL DATA
GASES
MASS SPECTROSCOPY
MEDIUM TEMPERATURE
MOLECULAR BEAMS
TARGETS
BEAMS
DATA
ELEMENTS
ENERGY
FLUIDS
HALOGENS
INFORMATION
NONMETALS
NUMERICAL DATA
PHYSICAL PROPERTIES
SEMIMETALS
SPECTROSCOPY
360601* - Other Materials- Preparation & Manufacture