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Elimination of dark line defects in lattice-mismatched epilayers through use of strained-layer superlattices

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.96099· OSTI ID:5576447
The microscopic optical quality of thick (approx.1 ..mu..m) III-V semiconductor epitaxial layers, mismatched to their substrates, is examined by photoluminescence microimaging. The layers include several kinds of strained-layer superlattices (GaP/GaAs/sub x/P/sub 1-x/, GaAs/GaAs/sub 1-x/P/sub x/, and GaAs/In/sub x/Ga/sub 1-x/As) and associated alloys. Microscopic images of epilayer luminescence directly reveal the presence of misfit dislocations which appear as dark line defects. These defects can be completely eliminated in the strained-layer superlattices if these structures have thin layers, less than the critical thickness for elastic accommodation, and sufficient numbers of interfaces of block threading dislocations.
Research Organization:
Sandia National Laboratories, Albuquerque, New Mexico 87185
DOE Contract Number:
AC04-76DP00789
OSTI ID:
5576447
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 47:5; ISSN APPLA
Country of Publication:
United States
Language:
English