Detection of CF/sub 2/ radicals in a plasma etching reactor by laser-induced fluorescence spectroscopy

Journal Article · Sat May 01 00:00:00 EDT 1982 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.93257· OSTI ID:5572687

Hargis, Jr, P J; Kushner, M J

Laser-induced fluorescence spectroscopy was used to detect ground-state CF/sub 2/ radicals in 13.56-MHz discharge plasmas sustained in C/sub 2/F/sub 6/ and CF/sub 4/ in a plasma etching reactor. Measurements of the relative CF/sub 2/(X) density in each plasma as a function of discharge power demonstrated that CF/sub 2/ densities were significantly higher in the C/sub 2/F/sub 6/ plasma. These results provide the first direct observation of CF/sub 2/(X) radicals in a plasma etching reactor.

• Research Organization: Sandia National Laboratories, Albuquerque, New Mexico 87185
• OSTI ID: 5572687
• Journal Information: Appl. Phys. Lett.; (United States), Vol. 40:9
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
PLASMA DIAGNOSTICS
CHEMICAL REACTIONS
ELECTRIC DISCHARGES
ETCHING
EXPERIMENTAL DATA
FLUORESCENCE
GROUND STATES
LASER RADIATION
MHZ RANGE
QUANTITY RATIO
RADIATION EFFECTS
RADICALS
SPECTROSCOPY
DATA
ELECTROMAGNETIC RADIATION
ENERGY LEVELS
FREQUENCY RANGE
INFORMATION
LUMINESCENCE
NUMERICAL DATA
RADIATIONS
SURFACE FINISHING
700102* - Fusion Energy- Plasma Research- Diagnostics