Electron-induced damage of ThF/sub 4/ thin films in the presence of XeF/sub 2/
Journal Article
·
· J. Vac. Sci. Technol., A; (United States)
During extensive bombardment with a 1-keV, 50-..mu..A electron beam, a ThF/sub 4/ thin film lost the equivalent of all of the fluorine in 27 monolayers as measured with a quartz crystal microbalance. The loss of surface fluorine was monitored with AES. This process is so efficient that initially almost every electron removes a fluorine atom. When the fluorine depleted surface was exposed to XeF/sub 2/ it rapidly gained back 1 equivalent monolayer of fluorine. Simultaneous exposure of a ThF/sub 4/ film to XeF/sub 2/ and 1-keV electrons showed a loss of 13 equivalent monolayers of fluorine. In the presence of XeF/sub 2/ and low-energy electrons ThF/sub 4/ can be made to rapidly absorb large quantities of fluorine. The influence of electron bombardment on fluorine desorption, sorption, and diffusion will be discussed.
- Research Organization:
- Physics Department, Washington State University, Pullman, Washington 99164-2814
- OSTI ID:
- 5567190
- Journal Information:
- J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 3:3; ISSN JVTAD
- Country of Publication:
- United States
- Language:
- English
Similar Records
Studies on the role of radiation in chemical reactions occurring on surfaces
Ion enhanced reactive etching of tungsten single crystals and films with XeF/sub 2/
Controlling the work function of a diamond-like carbon surface by fluorination with XeF{sub 2}
Thesis/Dissertation
·
Sat Dec 31 23:00:00 EST 1983
·
OSTI ID:6443894
Ion enhanced reactive etching of tungsten single crystals and films with XeF/sub 2/
Journal Article
·
Wed Jul 01 00:00:00 EDT 1987
· J. Vac. Sci. Technol., A; (United States)
·
OSTI ID:6512579
Controlling the work function of a diamond-like carbon surface by fluorination with XeF{sub 2}
Journal Article
·
Wed Sep 15 00:00:00 EDT 2010
· Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films
·
OSTI ID:22053998
Related Subjects
36 MATERIALS SCIENCE
360603* -- Materials-- Properties
ACTINIDE COMPOUNDS
ATOM TRANSPORT
AUGER ELECTRON SPECTROSCOPY
BALANCES
COLLISIONS
DAMAGE
DESORPTION
DIFFUSION
ELECTRON COLLISIONS
ELECTRON SPECTROSCOPY
ELEMENTS
ENERGY RANGE
FILMS
FLUORIDES
FLUORINE
FLUORINE COMPOUNDS
HALIDES
HALOGEN COMPOUNDS
HALOGENS
KEV RANGE
KEV RANGE 01-10
MEASURING INSTRUMENTS
MICROBALANCES
NEUTRAL-PARTICLE TRANSPORT
NONMETALS
PHYSICAL RADIATION EFFECTS
RADIATION EFFECTS
RADIATION TRANSPORT
RARE GAS COMPOUNDS
SORPTIVE PROPERTIES
SPECTROSCOPY
SURFACE PROPERTIES
THIN FILMS
THORIUM COMPOUNDS
THORIUM FLUORIDES
WEIGHT INDICATORS
XENON COMPOUNDS
XENON FLUORIDES
360603* -- Materials-- Properties
ACTINIDE COMPOUNDS
ATOM TRANSPORT
AUGER ELECTRON SPECTROSCOPY
BALANCES
COLLISIONS
DAMAGE
DESORPTION
DIFFUSION
ELECTRON COLLISIONS
ELECTRON SPECTROSCOPY
ELEMENTS
ENERGY RANGE
FILMS
FLUORIDES
FLUORINE
FLUORINE COMPOUNDS
HALIDES
HALOGEN COMPOUNDS
HALOGENS
KEV RANGE
KEV RANGE 01-10
MEASURING INSTRUMENTS
MICROBALANCES
NEUTRAL-PARTICLE TRANSPORT
NONMETALS
PHYSICAL RADIATION EFFECTS
RADIATION EFFECTS
RADIATION TRANSPORT
RARE GAS COMPOUNDS
SORPTIVE PROPERTIES
SPECTROSCOPY
SURFACE PROPERTIES
THIN FILMS
THORIUM COMPOUNDS
THORIUM FLUORIDES
WEIGHT INDICATORS
XENON COMPOUNDS
XENON FLUORIDES