Photoluminescence enhancement monitored in real time during photowashing of GaAs

Journal Article · Mon Jul 29 04:00:00 EDT 1991 · Applied Physics Letters; (United States)

DOI:https://doi.org/10.1063/1.105386· OSTI ID:5557790

Kauffman, J F; Richmond, G L ^[1]

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1. Department of Chemistry and Materials Science Institute, University of Oregon, Eugene, Oregon 97403 (USA)

We have observed the luminescence emitted from GaAs during the surface treatment process known as photowashing. This allows us to probe the extent of surface quality improvement in real time as the treatment proceeds. We observe a tenfold increase in photoluminescence (PL) intensity during photowashing, which provides unambiguous proof that PL enhancement does not require an activation step following photowashing. We also observe that the PL enhancement persists for at least 1 h under continued photowashing. Studies performed to elucidate the chemistry of PL enhancement indicate that sample history has a critical influence on experimental results, and that experimental details cannot be overlooked when comparing different experiments. We quantify the improvement in surface quality by measuring surface minority trapping velocities from luminescence decay profiles following picosecond optical excitation.

• DOE Contract Number: FG06-86ER45273
• OSTI ID: 5557790
• Journal Information: Applied Physics Letters; (United States), Journal Name: Applied Physics Letters; (United States) Vol. 59:5; ISSN APPLA; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360603* -- Materials-- Properties
360604 -- Materials-- Corrosion
Erosion
& Degradation
ARSENIC COMPOUNDS
ARSENIDES
CHEMICAL REACTIONS
CHEMISTRY
ENERGY LEVELS
FERMI LEVEL
GALLIUM ARSENIDES
GALLIUM COMPOUNDS
LUMINESCENCE
OXIDATION
PHOTOCHEMISTRY
PHOTOLUMINESCENCE
PNICTIDES
SURFACE TREATMENTS