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Microstructures of thin sputtered amorphous Tb/sub 0. 26/Fe/sub 0. 74/ and polycrystalline Fe films

Journal Article · · J. Vac. Sci. Technol., A; (United States)
DOI:https://doi.org/10.1116/1.573881· OSTI ID:5542674
A transmission electron microscope was used to characterize the microstructure of Te/sub 0.26/Fe/sub 0.74/ and Fe films obtained by magnetron and dc diode sputtering techniques. The films obtained by magnetron sputtering were very smooth, whereas those by diode sputtering were not smooth but islandlike, similar to the columnar structure. The microstructures were further examined by varying the pressure of argon gas. In both sputtering systems, an increase in the pressure promotes a tendency of the columnar structure to form.
Research Organization:
AT and T Bell Laboratories, Murray Hill, New Jersey 07974
OSTI ID:
5542674
Journal Information:
J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 4:3; ISSN JVTAD
Country of Publication:
United States
Language:
English