Oblique sputtering of amorphous TbFeCo thin films on glass substrates and the effect of deposition angle on perpendicular magnetic anisotropy

Journal Article · Mon Mar 31 23:00:00 EST 1997 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.364959· OSTI ID:554249

Hsieh, Y; Gadetsky, S ^[1]; Suzuki, T ^[2]; Mansuripur, M ^[1]

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1. Optical Sciences Center, University of Arizona, Tucson, Arizona 85721 (United States)
2. Toyota Technological Institute, Nagoya (Japan)

We measured the magnetic hysteresis loops for several obliquely deposited amorphous TbFeCo films. The experimental results show that the direction of the average magnetic anisotropy (i.e., the easy axis of magnetization) is no longer along the surface normal. With the help of computer simulations, we have quantified the effects of oblique deposition in terms of the deviations of local anisotropy directions from the surface normal. We also found that, with the increasing of the deposition angle, the compensation point shifts toward the Fe-rich side and the films become thinner. {copyright} {ital 1997 American Institute of Physics.}

• OSTI ID: 554249
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 8 Vol. 81; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ANISOTROPY
COBALT ALLOYS
FERROMAGNETIC MATERIALS
INTERMETALLIC COMPOUNDS
IRON ALLOYS
MAGNETIC PROPERTIES
MAGNETIZATION
SPUTTERING
TERBIUM ALLOYS
THIN FILMS