Strong uniaxial magnetic anisotropy in CoFe films on obliquely sputtered Ru underlayer

Journal Article · Thu Oct 01 00:00:00 EDT 2009 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.3223538· OSTI ID:21361877

Fukuma, Y; Lu, Z; Fujiwara, H; Mankey, G J; Butler, W H ^[1]; Matsunuma, S ^[2]

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1. MINT Center, University of Alabama, Tuscaloosa, Alabama 35487 (United States)
2. Hitachi Maxell Ltd., R and D Division, 1-1-88 Ushitora, Ibaraki, Osaka 567-8567 (Japan)

Co{sub 90}Fe{sub 10} films with an in-plane uniaxial magnetic anisotropy have been grown on an obliquely sputtered thin Ru underlayer. The anisotropy field can be increased up to 200 Oe. The hysteresis curves show a very high squareness in the easy axis direction and almost no hysteresis in the hard axis direction, suggesting that the induced uniaxial anisotropy is uniform throughout the films. The switching characteristics of the nanoelements fabricated from the films by e-beam lithography are also investigated. There is no degradation of the magnetic anisotropy after the annealing and lithographical process.

• OSTI ID: 21361877
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 7 Vol. 106; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
77 NANOSCIENCE AND NANOTECHNOLOGY
ALLOYS
ANISOTROPY
ANNEALING
BEAMS
COBALT ALLOYS
DEPOSITION
ELECTRON BEAMS
ELEMENTS
FABRICATION
FILMS
HEAT TREATMENTS
HYSTERESIS
IRON ALLOYS
LEPTON BEAMS
METALS
NANOSTRUCTURES
PARTICLE BEAMS
PLATINUM METALS
REFRACTORY METALS
RUTHENIUM
SEMIMETALS
SILICON
SPUTTERING
THIN FILMS
TRANSITION ELEMENT ALLOYS
TRANSITION ELEMENTS