Microstructure evolution in TiN films reactively sputter deposited on multiphase substrates

Journal Article · Thu May 01 04:00:00 EDT 1986 · J. Vac. Sci. Technol., A; (United States)

DOI:https://doi.org/10.1116/1.573868· OSTI ID:5541509

Helmersson, U; Sundgren, J; Greene, J E

Cross-sectional transmission electron microscopy (X-TEM) has been used to investigate the microstructure of TiN films deposited by reactive magnetron sputtering onto ASP 30 high speed steel (HSS) substrates. ASP 30 is a multiphase material consisting of a martensitic matrix with MC and M/sub 6/C transition--metal particles embedded in it. The TiN films were approx.4 ..mu..m thick and were grown at substrate temperatures T/sub s/ between 200 and 550/sup 0/C. The X-TEM results showed that the film microstructure was very nonhomogeneous. A dense columnar morphology was observed above both the martensitic and M/sub 6/C substrate phases. The average column diameter ranged from 15 nm (T/sub s/ = 200/sup 0/C) to 50 nm (T/sub s/ = 550/sup 0/C) near the film/substrate interface over the martensitic phase and was in a factor of 2 less in the film regions adjacent to the M/sub 6/C phase. increased in both regions to 100 nm (T/sub s/ = 200/sup 0/C) to 150 nm (T/sub s/ = 550/sup 0/C) near the surface of the films. TiN grew epitaxially on MC particles but contained a high dislocation density which (except at 550/sup 0/C where some of the epitaxial grains extended throughout the entire film thickness) eventually coalesced to form low-angle grain boundaries and, finally, high-angle boundaries.

• Research Organization: Thin Film Group, Department of Physics and Measurement Technology, Linkoeping University, S-581 83 Linkoeping, Sweden
• DOE Contract Number: AC02-76ER01198
• OSTI ID: 5541509
• Journal Information: J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 4:3; ISSN JVTAD
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360201 -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
360202* -- Ceramics
Cermets
& Refractories-- Structure & Phase Studies
DEPOSITION
ELECTRON MICROSCOPY
FILMS
MICROSCOPY
NITRIDES
NITROGEN COMPOUNDS
PNICTIDES
SPUTTERING
TITANIUM COMPOUNDS
TITANIUM NITRIDES
TRANSITION ELEMENT COMPOUNDS
TRANSMISSION ELECTRON MICROSCOPY