Electronic structure and properties of sputtered Ta-Cu films

Journal Article · Mon Feb 15 04:00:00 EST 1988 · Phys. Rev. B: Condens. Matter; (United States)

DOI:https://doi.org/10.1103/PhysRevB.37.2426· OSTI ID:5532014

Aylesworth, K D; Jaswal, S S; Engelhardt, M A; Zhao, Z R; Sellmyer, D J

Films of Ta/sub x/Cu/sub 1-//sub x/ have been produced in a co-sputtering system with dc- and rf-sputtering guns and a substrate attached to a rapidly rotating, water-cooled table. Samples were produced in the composition range 0.1less than or equal toxless than or equal to0.9. X-ray diffraction and electrical resistivity data between 4.2 and 300 K have been obtained. Diffraction measurements show that for 0.6less than or equal toxless than or equal to0.9 the samples are glassy. The room-temperature resistivities follow the Mooij correlation with a zero temperature coefficient of resistivity at a resistivity of 35 ..mu cap omega.. cm. The resistivity-versus-temperature data for Ta/sub 0.90/Cu/sub 0.10/ are compared to the extended Ziman-Faber theory and a localization theory by Kaveh and Mott. Of these two theories, the Kaveh-Mott theory best describes the experimental results. Ultraviolet and x-ray photoemission measurements have been made as a function of composition. The position of the Cu 3d levels appears to be correlated with the amorphous or crystalline character of the structure. A linear muffin-tin-orbital calculation of the electronic structure of amorphous Ta/sub 0.59/Cu/sub 0.41/ has been performed. The calculation, based on a periodically extended amorphous cluster of 39 atoms, gave an electronic density of states in good agreement with photoemission results.

• Research Organization: Behlen Laboratory of Physics, University of Nebraska, Lincoln, Nebraska 68588
• OSTI ID: 5532014
• Journal Information: Phys. Rev. B: Condens. Matter; (United States), Journal Name: Phys. Rev. B: Condens. Matter; (United States) Vol. 37:5; ISSN PRBMD
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360104* -- Metals & Alloys-- Physical Properties
ALLOYS
COHERENT SCATTERING
COPPER ALLOYS
DIFFRACTION
ELECTRIC CONDUCTIVITY
ELECTRICAL PROPERTIES
ELECTROMAGNETIC RADIATION
ELECTRON SPECTROSCOPY
ELECTRONIC STRUCTURE
FILMS
IONIZING RADIATIONS
LOW TEMPERATURE
MEDIUM TEMPERATURE
METALLIC GLASSES
MUFFIN-TIN POTENTIAL
PHOTOELECTRON SPECTROSCOPY
PHYSICAL PROPERTIES
POTENTIALS
QUANTITY RATIO
RADIATIONS
SCATTERING
SPECTROSCOPY
SPUTTERING
TANTALUM ALLOYS
TEMPERATURE DEPENDENCE
ULTRALOW TEMPERATURE
ULTRAVIOLET RADIATION
VERY LOW TEMPERATURE
X RADIATION
X-RAY DIFFRACTION