Characterization of optical coatings: Damage threshold/local absorption correlation
Conference
·
OSTI ID:552277
- Domaine Universitaire de Saint Jerome (France); and others
Simultaneous absorption and scattering mappings are used to study the influence of local defects on the laser damage threshold of thin films. The same area is mapped for absorption and scatter before and after irradiation at the threshold fluence. The study is performed for an uncoated fused silica substrate and two single-layer films deposited on fused silica substrates at a wavelength of {lambda} = 1.06 {mu}m. Initial results seem to indicate that the irradiation can create and enhance absorption and scattering defects. This study is conducted as part of the Megajoule laser project.
- Research Organization:
- International Society for Optical Engineering, Washington, DC (United States)
- OSTI ID:
- 552277
- Report Number(s):
- CONF-961070--Vol.2966
- Country of Publication:
- United States
- Language:
- English
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