Negative Power Absorption in Inductively Coupled Plasma
Journal Article
·
· Physical Review Letters
- OSRAM SYLVANIA Products Inc., 71 Cherry Hill Drive, Beverly, Massachusetts 01915 (United States)
- Department of Chemical Engineering, University of Houston, Houston, Texas 77204-4792 (United States)
We report an observation of negative power absorption of electromagnetic field in a low-pressure cylindrical inductive discharge. The spatial distribution of the absorbed power is found experimentally from measurement of the azimuthal rf electric field and current, and theoretically by solving the Maxwell-Boltzmann equations by Fourier method. It appears that plasma electrons, which absorb electromagnetic energy in the skin layer, can apparently return a part of their energy to the rf field deeper into the plasma. {copyright} {ital 1997} {ital The American Physical Society}
- OSTI ID:
- 550585
- Journal Information:
- Physical Review Letters, Journal Name: Physical Review Letters Journal Issue: 23 Vol. 79; ISSN 0031-9007; ISSN PRLTAO
- Country of Publication:
- United States
- Language:
- English
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