X-ray zone plates fabricated using electron-beam and x-ray lithography

Journal Article · Thu Nov 01 04:00:00 EST 1979 · J. Vac. Sci. Technol.; (United States)

DOI:https://doi.org/10.1116/1.570258· OSTI ID:5489982

Shaver, D C; Flanders, D C; Ceglio, N M; Smith, H I

Fresnel zone plate patterns, free of spherical aberration, with diameters of up to 0.63 mm and linewidths as small as 1000 A were fabricated on polyimide membrane x-ray masks using scanning electron beam lithography. Distortion of the electron beam scan raster was reduced to < or =2500 A over a 2 x 2 mm field by applying deflection corrections, while viewing the distortion using a Moire method. C/sub K/ x-ray lithography was used to replicate the zone plate pattern in thick PMMA over a 100 A thick plating base on a glass substrate. Zones plates in 1.3 ..mu..m thick gold were fabricated by plating, and made free-standing by removal of the plating base and the supporting glass substrate. Zone plates were tested as imaging elements with visible light and soft x-rays.

• Research Organization: Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02173
• OSTI ID: 5489982
• Journal Information: J. Vac. Sci. Technol.; (United States), Journal Name: J. Vac. Sci. Technol.; (United States) Vol. 16:6; ISSN JVSTA
• Country of Publication: United States
• Language: English

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