Film properties of CVD titanium nitride deposited with organometallic precursors at low pressure using inert gases, ammonia, or remote activation
- Siemens AG, Munich (Germany). Semiconductor Group
- Technical Univ. Munich (Germany). Semiconductor Physics
Chemical vapor deposited (CVD)-TiN layers are required as interdiffusion barriers for the fabrication of microelectronic devices. The deposition of CVD-TiN from a metallorganic precursor, tetrakis-(dimethylamido)-titanium (IV),Ti[N(CH[sub 3])[sub 2]][sub 4] has been investigated and compared using three different experimental approaches: the thermal decomposition of the precursor, its thermal reaction with ammonia, and its reaction with H[sub 2]/N[sub 2] mixtures which have been activated in a remote microwave plasma (2.46 GHz). The experiments have been carried out at moderate temperatures of 250--500 C and pressures between 0.5 and 5 Torr. Mass spectrometric analysis of the effluent gases have been performed and reaction mechanisms for the different experimental conditions are postulated based on these investigations. The application of remote plasma activated H[sub 2]/N[sub 2] mixtures instead of ammonia is a major breakthrough in controlling the reactivity of the chemical partners and is proposed to be also used during CVD-TiN formation from TiCl[sub 4].
- OSTI ID:
- 5489383
- Journal Information:
- Journal of the Electrochemical Society; (United States), Journal Name: Journal of the Electrochemical Society; (United States) Vol. 140:11; ISSN 0013-4651; ISSN JESOAN
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
CHEMICAL COATING
CHEMICAL REACTION KINETICS
CHEMICAL VAPOR DEPOSITION
COATINGS
COMPARATIVE EVALUATIONS
DEPOSITION
ELECTRIC CONDUCTIVITY
ELECTRICAL PROPERTIES
EVALUATION
KINETICS
NITRIDES
NITROGEN COMPOUNDS
PERMEABILITY
PHYSICAL PROPERTIES
PNICTIDES
REACTION KINETICS
SURFACE COATING
TITANIUM COMPOUNDS
TITANIUM NITRIDES
TRANSITION ELEMENT COMPOUNDS
VAPOR DEPOSITED COATINGS