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Microstructure and phase composition of sputter-deposited zirconia-yttria films

Conference ·
OSTI ID:5487840
Thin ZrO/sub 2/-Y/sub 2/O/sub 3/ coatings ranging in composition from 3 to 15 mole % Y/sub 2/O/sub 3/ were produced by rf sputter deposition. This composition range spanned the region on the equilibrium ZrO/sub 2/-Y/sub 2/O/sub 3/ phase diagram corresponding to partially stabilized zirconia (a mixture of tetragonal ZrO/sub 2/ and cubic solid solution). Microstructural characteristics and crystalline phase composition of as-deposited and heat treated films (1100/sup 0/C and 1500/sup 0/C) were determined by transmission electron microscopy (TEM) and by x-ray diffraction (XRD). Effects of substrate bias (0 approx. 250 volts), which induced ion bombardment of the film during growth, were also studied. The as-deposited ZrO/sub 2/-Y/sub 2/O/sub 3/ films were single phase over the composition range studied, and XRD data indicated considerable local atomic disorder in the lattice. Films produced at low bias contained intergranular voids, pronounced columnar growth, and porosity between columns. At high bias, the microstructure was denser, and films contained high compressive stress. After heat treatment, all deposits remained single phase, therefore a microstructure and precipitate distribution characteristic of toughened, partially stabilized zirconia appear to be difficult to achieve in vapor deposited zirconia coatings.
Research Organization:
Pacific Northwest Lab., Richland, WA (USA)
DOE Contract Number:
AC06-76RL01830
OSTI ID:
5487840
Report Number(s):
PNL-SA-11504; CONF-831174-19; ON: DE84003352
Country of Publication:
United States
Language:
English