Effects of nitrogen pulsing on sputter-deposited beryllium films
Beryllium films have been used as a heat sink'' layer between the reflective coating of a mirror and its glass substrate to improve the mirror's radiation resistance to prompt deposition of x-rays. Under x-ray irradiation, the beryllium heat sink'' layer is subjected to tensile stresses caused by differences in thermal expansion coefficients. Test results indicated that the predominant failure mode was the film's crazing under tensile stress. The inherent columnar structure of the beryllium films deposited under normal conditions in detrimental to the tensile strength of the films and may be responsible for this type of failure. We successfully suppressed the inherent columnar growth in beryllium films by incorporating periodic N{sub 2} pulses during sputter deposition. Quantitative analyses were conducted for nitrogen and oxygen contamination in the beryllium films using standards prepared by ion implantation. Secondary ion mass spectroscopy (SIMS) depth profiles were obtained for oxygen and nitrogen using mass isotopes {sup 16}O and 23({sup 9}Be + {sup 14}N).
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- DOE/DP
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 5487822
- Report Number(s):
- UCRL-98780; CONF-891093-13; ON: DE90003058
- Resource Relation:
- Journal Volume: 8; Journal Issue: 3; Conference: 36. American Vacuum Society national vacuum symposium, Boston, MA (USA), 23-27 Oct 1989
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
BERYLLIUM
THIN FILMS
MICROANALYSIS
DEPOSITION
FAILURES
MICROSTRUCTURE
NITROGEN
PULSES
QUANTITATIVE CHEMICAL ANALYSIS
SPUTTERING
SUBSTRATES
TENSILE PROPERTIES
ALKALINE EARTH METALS
CHEMICAL ANALYSIS
CRYSTAL STRUCTURE
ELEMENTS
FILMS
MECHANICAL PROPERTIES
METALS
NONMETALS
360102* - Metals & Alloys- Structure & Phase Studies
360103 - Metals & Alloys- Mechanical Properties