Microstructure of bulk and electro-formed Ni implanted with Ti and C

Conference · Mon Oct 13 00:00:00 EDT 1997

OSTI ID:548627

Follstaedt, D M; Myers, S M; Knapp, J A; Dugger, M T; Christenson, T A

The microstructure of high-purity Ni implanted with overlapping concentration profiles of Ti and C was examined with transmission electron microscopy. An amorphous phase forms at concentrations of 15--18 at.% Ti and 22 at.% C, while a two-phase alloy (amorphous + fcc Ni) forms for {le} 16 at.% C. Electroformed layers with sub-micron fcc grains of Ni or Ni{sub 80}Fe{sub 20} were also found to be amorphized by Ti + C implantation, a key requirement for applying this treatment to Ni-based micro-electromechanical systems to reduce their friction and wear.

• Research Organization: Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
• Sponsoring Organization: USDOE Office of Energy Research, Washington, DC (United States)
• DOE Contract Number: AC04-94AL85000
• OSTI ID: 548627
• Report Number(s): SAND-97-1216C; CONF-9709107-; ON: DE98001189; BR: KC0201030; TRN: AHC29724%%28
• Resource Relation: Conference: 10. international conference on surface modification of metals by ion beams (SMMIB-10) and commercial exhibition, Gatlinburg, TN (United States), 21-26 Sep 1997; Other Information: PBD: 13 Oct 1997
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
NICKEL
MICROSTRUCTURE
ION IMPLANTATION
TITANIUM
CARBON
ELECTRODEPOSITION
PHASE STUDIES
FRICTION FACTOR
WEAR RESISTANCE
MINIATURIZATION
MACHINERY