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Microstructure of bulk and electro-formed Ni implanted with Ti and C

Conference ·
OSTI ID:548627

The microstructure of high-purity Ni implanted with overlapping concentration profiles of Ti and C was examined with transmission electron microscopy. An amorphous phase forms at concentrations of 15--18 at.% Ti and 22 at.% C, while a two-phase alloy (amorphous + fcc Ni) forms for {le} 16 at.% C. Electroformed layers with sub-micron fcc grains of Ni or Ni{sub 80}Fe{sub 20} were also found to be amorphized by Ti + C implantation, a key requirement for applying this treatment to Ni-based micro-electromechanical systems to reduce their friction and wear.

Research Organization:
Sandia National Labs., Albuquerque, NM (United States)
Sponsoring Organization:
USDOE Office of Energy Research, Washington, DC (United States)
DOE Contract Number:
AC04-94AL85000
OSTI ID:
548627
Report Number(s):
SAND--97-1216C; CONF-9709107--; ON: DE98001189; BR: KC0201030
Country of Publication:
United States
Language:
English