Room-temperature pulsed operation of AlGaInP/GaInP/AlGaInP double heterostructure visible light laser diodes grown by metalorganic chemical vapor deposition
Journal Article
·
· Appl. Phys. Lett.; (United States)
Room-temperature pulsed laser operation of (Al/sub 0.3/Ga/sub 0.7/)/sub 0.5/In/sub 0.5/P/ Ga/sub 0.5/In/sub 0.5/P/ (Al/sub 0.3/Ga/sub 0.7/)/sub 0.5/In/sub 0.5/P double heterostructure laser diodes grown by metalorganic chemical vapor deposition has been achieved for the first time. The lowest threshold current density was 26 kA/cm/sup 2/ for a diode with a 22-..mu..m-wide and 160-..mu..m-long stripe. The lasing wavelength was 0.683 ..mu..m.
- Research Organization:
- Opto-Electronics Research Laboratories, NEC Corporation, 1-1, Miyazaki 4-chome, Miyamae-ku, Kawasaki 213, Japan
- OSTI ID:
- 5482878
- Journal Information:
- Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 43:11; ISSN APPLA
- Country of Publication:
- United States
- Language:
- English
Similar Records
AlGaInP double heterostructure visible-light laser diodes with a GaInP active layer grown by metalorganic vapor phase epitaxy
626. 2-nm pulsed operation (300 K) of an AlGaInP double heterostructure laser grown by metalorganic chemical vapor deposition
cw operation of an AlGaInP double heterostructure laser diode at 77 K grown by atmospheric metalorganic chemical vapor deposition
Journal Article
·
Mon Jun 01 00:00:00 EDT 1987
· IEEE J. Quant. Electron.; (United States)
·
OSTI ID:6362074
626. 2-nm pulsed operation (300 K) of an AlGaInP double heterostructure laser grown by metalorganic chemical vapor deposition
Journal Article
·
Mon Dec 31 23:00:00 EST 1984
· Appl. Phys. Lett.; (United States)
·
OSTI ID:6253961
cw operation of an AlGaInP double heterostructure laser diode at 77 K grown by atmospheric metalorganic chemical vapor deposition
Journal Article
·
Sat Sep 15 00:00:00 EDT 1984
· Appl. Phys. Lett.; (United States)
·
OSTI ID:6763147
Related Subjects
42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
ALUMINIUM COMPOUNDS
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
DATA
DEPOSITION
ELECTROMAGNETIC RADIATION
EMISSION
ENERGY
ENERGY-LEVEL TRANSITIONS
EXPERIMENTAL DATA
GALLIUM COMPOUNDS
HETEROJUNCTIONS
INDIUM COMPOUNDS
INFORMATION
JUNCTIONS
LASERS
MEDIUM TEMPERATURE
NUMERICAL DATA
OPERATION
PHOSPHORUS COMPOUNDS
PULSES
RADIATIONS
SEMICONDUCTOR DEVICES
SEMICONDUCTOR DIODES
SEMICONDUCTOR JUNCTIONS
SEMICONDUCTOR LASERS
STIMULATED EMISSION
SURFACE COATING
THRESHOLD ENERGY
VISIBLE RADIATION
420300* -- Engineering-- Lasers-- (-1989)
ALUMINIUM COMPOUNDS
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
DATA
DEPOSITION
ELECTROMAGNETIC RADIATION
EMISSION
ENERGY
ENERGY-LEVEL TRANSITIONS
EXPERIMENTAL DATA
GALLIUM COMPOUNDS
HETEROJUNCTIONS
INDIUM COMPOUNDS
INFORMATION
JUNCTIONS
LASERS
MEDIUM TEMPERATURE
NUMERICAL DATA
OPERATION
PHOSPHORUS COMPOUNDS
PULSES
RADIATIONS
SEMICONDUCTOR DEVICES
SEMICONDUCTOR DIODES
SEMICONDUCTOR JUNCTIONS
SEMICONDUCTOR LASERS
STIMULATED EMISSION
SURFACE COATING
THRESHOLD ENERGY
VISIBLE RADIATION