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Transfer of a metal from a transparent film to the surface of silicon to produce P-N junction solar cells

Journal Article · · J. Sol. Energy Eng.; (United States)
DOI:https://doi.org/10.1115/1.3268074· OSTI ID:5472771
A new method is proposed for preparing silicon P-N junctions. The first consists in fixing a transparent plastic film coated with a thin layer of a conventional dopant on the surface of the wafer, then illuminating this sandwich with a higher power Q switched laser. Two successive pulses are used, the first being able to transfer the dopant from the film to the silicon surface, the second to induce a liquid phase diffusion incorporating the dopant into the silicon lattice. Solar cells have been prepared by using this process, implying several attractive features.
Research Organization:
Ciril-Ganil, 14040 Caen
OSTI ID:
5472771
Journal Information:
J. Sol. Energy Eng.; (United States), Journal Name: J. Sol. Energy Eng.; (United States) Vol. 108:2; ISSN JSEED
Country of Publication:
United States
Language:
English