Surface segregation and growth-mode transitions during the initial stages of Si growth on Ge(001)2[times]1 by cyclic gas-source molecular beam epitaxy from Si[sub 2]H[sub 6]
- Department of Materials Science, the Coordinated Science Laboratory and the Materials Research Laboratory, University of Illinois, Urbana, Illinois 61801 (United States)
- Department of Physics and the Materials Research Laboratory, University of Illinois, Urbana, Illinois 61801 (United States)
Surface morphological and compositional evolution during the initial stages of Si growth on Ge(001)2[times]1 by cyclic gas-source molecular beam epitaxy from Si[sub 2]H[sub 6] has been investigated using [ital in] [ital situ] reflection high-energy electron diffraction (RHEED), Auger electron spectroscopy, electron-energy-loss spectroscopy, and scanning tunneling microscopy, combined with post-deposition high-resolution cross-sectional transmission electron microscopy. The layers were deposited using repetitive cycles consisting of saturation Si[sub 2]H[sub 6] dosing at room temperature, followed by annealing for 1 min at 550 [degree]C. Film growth was observed to proceed via a mixed Stranski--Krastanov mode. Single-step-height two-dimensional growth was obtained for nominal Si deposition thicknesses [ital t][sub Si] up to [congruent]1.5 monolayers (ML). However, the upper layer remained essentially pure Ge which segregated to the surface through site exchange with deposited Si as H was desorbed. At higher [ital t][sub Si], the Ge coverage decreased slowly, the surface roughened, and two-dimensional multilayer island growth was observed for [ital t][sub Si] up to [congruent]7.5 ML, where bulk reflections in RHEED patterns provided evidence for the evolution of three-dimensional island formula.
- DOE Contract Number:
- FG02-91ER45439
- OSTI ID:
- 5445881
- Journal Information:
- Journal of Applied Physics; (United States), Vol. 75:1; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
GERMANIUM
SEGREGATION
SILICON
MOLECULAR BEAM EPITAXY
ELECTRON DIFFRACTION
ELECTRON MICROSCOPY
ELECTRON SPECTROSCOPY
GROWTH
COHERENT SCATTERING
DIFFRACTION
ELEMENTS
EPITAXY
METALS
MICROSCOPY
SCATTERING
SEMIMETALS
SPECTROSCOPY
360606* - Other Materials- Physical Properties- (1992-)