Characterization of interfacial roughness in Co/Cu multilayers by x-ray scattering

Journal Article · Mon Sep 01 04:00:00 EDT 1997 · Physical Review, B: Condensed Matter

DOI:https://doi.org/10.1103/PhysRevB.56.6474· OSTI ID:542618

Gu, T; Goldman, A I ^[1]; Mao, M ^[2]

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1. Ames Laboratory-USDOE and Department of Physics and Astronomy, Iowa State University, Ames, Iowa 50011 (United States)
2. Department of Physics Astronomy, McMaster University, Hamilton, Ontario, L8S 4M1 (CANADA)

The interfacial roughness of a magnetron-sputtered Si(001)/[Co12{Angstrom}/Cu9.7{Angstrom}]{sub 30}/(Cu30{Angstrom}) multilayer was investigated by x-ray scattering, and partial conformal roughness was observed. Specular, longitudinal, and transverse diffuse intensities were acquired by a high-resolution triple-crystal x-ray diffractometer and evaluated simultaneously based on the distorted-wave Born approximation. An approach to the analysis of the diffuse signal is proposed. {copyright} {ital 1997} {ital The American Physical Society}

• Research Organization: Ames National Laboratory
• DOE Contract Number: W-7405-ENG-82
• OSTI ID: 542618
• Journal Information: Physical Review, B: Condensed Matter, Journal Name: Physical Review, B: Condensed Matter Journal Issue: 11 Vol. 56; ISSN 0163-1829; ISSN PRBMDO
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
BORN APPROXIMATION
COBALT
COPPER
INTERFACES
LAYERS
ROUGHNESS
SPUTTERING
X-RAY DIFFRACTION