Diode laser excited optogalvanic spectroscopy of glow discharges

Journal Article · Wed Jan 01 04:00:00 EST 1997 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.52161· OSTI ID:542090

Barshick, C M; Shaw, R W; Jennings, L W; Post-Zwicker, A; Young, J P; Ramsey, J M ^[1]

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1. Chemical Analytical Sciences Division, Oak Ridge National Laboratory, P.O. Box 2008, Oak Ridge, Tenessee 37831-6142 (United States)

The development of diode-laser-excited isotopically-selective optogalvanic spectroscopy (OGS) of uranium metal, oxide and fluoride in a glow discharge (GD) is presented. The technique is useful for determining {sup 235}U/({sup 235}U+{sup 238}U) isotope ratios in these samples. The precision and accuracy of this determination is evaluated, and a study of experimental parameters pertaining to optimization of the measurement is discussed. Application of GD-OGS to other f-transition elements is also described. {copyright} {ital 1997 American Institute of Physics.}

• Research Organization: Oak Ridge National Laboratory
• Sponsoring Organization: USDOE
• DOE Contract Number: AC05-96OR22464
• OSTI ID: 542090
• Report Number(s): CONF-960686--
• Journal Information: AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 388; ISSN 0094-243X; ISSN APCPCS
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
EXCITATION
GLOW DISCHARGES
ISOTOPE RATIO
LASER RADIATION
OPTICAL PROPERTIES
PHOTOIONIZATION
URANIUM