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Diode laser excited optogalvanic spectroscopy of glow discharges

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.52161· OSTI ID:21165660
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  1. Chemical and Analytical Sciences Division, Oak Ridge National Laboratory, P.O. Box 2008, Oak Ridge, Tenessee 37831-6142 (United States)
The development of diode-laser-excited isotopically-selective optogalvanic spectroscopy (OGS) of uranium metal, oxide and fluoride in a glow discharge (GD) is presented. The technique is useful for determining {sup 235}U/({sup 235}U+{sup 238}U) isotope ratios in these samples. The precision and accuracy of this determination is evaluated, and a study of experimental parameters pertaining to optimization of the measurement is discussed. Application of GD-OGS to other f-transition elements is also described.
OSTI ID:
21165660
Journal Information:
AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 388; ISSN 0094-243X; ISSN APCPCS
Country of Publication:
United States
Language:
English