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Title: X-ray zone plates fabricated using electron-beam and x-ray lithography

Conference ·
OSTI ID:5412333

Fresnel zone plate patterns, free of spherical abberation, with diameters of up to 0.63 mm and linewidths as small as 1000 A were fabricated on polyimide-membrane x-ray masks using scanning electron beam lithography Distortion of the electron beam scan raster was reduced to < 2500 A over a 2 mm x 2 mm field by applying deflection corrections, while viewing the distortion using a moire method. C/sub k/ x-ray lithography was used to replicate the zone plate pattern in thick PMMA over a 100 A thick plating base on a glass substrate. Zones plates in 1.3 ..mu..m thick gold were fabricated by plating, and made free-standing by removal of the plating base and the supporting glass substrate. Zone plates were tested as imaging elements with visible light and soft x-rays.

Research Organization:
Massachusetts Inst. of Tech., Lexington (USA). Lincoln Lab.; California Univ., Livermore (USA). Lawrence Livermore Lab.; Massachusetts Inst. of Tech., Cambridge (USA)
DOE Contract Number:
W-7405-ENG-48
OSTI ID:
5412333
Report Number(s):
UCRL-84043; CONF-7905140-1; TRN: 80-007550
Resource Relation:
Conference: 15. symposium on electron, ion and photon beam technology, Boston, MA, USA, May 1979
Country of Publication:
United States
Language:
English