UV picosecond pulse amplification by a XeCl laser

Journal Article · Mon Apr 14 23:00:00 EST 1980 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.91607· OSTI ID:5392647

Maeda, M; Mizunami, T; Sato, A; Uchino, O; Miyazoe, Y

A UV-preionized discharge-pumped XeCl excimer laser effectively amplified the frequency-doubled picosecond (3--4 ps) pulses generated by a passively mode-locked flashlamp-pumped rhodamine 6G dye laser tuned to the 308-nm band. The peak power of the amplified pulse is 710 MW, and the net power gain is 151. The proposed scheme is promising for the construction of a scalable high-power ultrashort-pulse generator in the UV region.

• Research Organization: Department of Electrical Engineering, Faculty of Engineering, Kyshu University, Hakozaki, Higashi-ku, Fukuoka 812, Japan
• OSTI ID: 5392647
• Journal Information: Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 36:8; ISSN APPLA
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
AMINES
AMPLIFIERS
CARBOXYLIC ACIDS
CHLORIDES
CHLORINE COMPOUNDS
DYE LASERS
DYES
ELECTRIC DISCHARGES
ELECTROMAGNETIC RADIATION
ELECTRONIC EQUIPMENT
FREQUENCY CONVERTERS
GAIN
GAS LASERS
HALIDES
HALOGEN COMPOUNDS
HETEROCYCLIC ACIDS
HETEROCYCLIC COMPOUNDS
LASERS
MODE LOCKING
ORGANIC ACIDS
ORGANIC COMPOUNDS
ORGANIC OXYGEN COMPOUNDS
POWER RANGE 100-1000 MW
PULSES
RADIATIONS
RARE GAS COMPOUNDS
REAGENTS
RHODAMINES
ULTRAVIOLET RADIATION
WAVELENGTHS
XENON CHLORIDES
XENON COMPOUNDS