Reaction of thin metal films with crystalline and amorphous Al/sub 2/O/sub 3/

Technical Report · Mon Dec 01 04:00:00 EST 1986

OSTI ID:5389680

Zhao, X; Kolawa, E; Nicolet, M

The authors investigated the thermal reaction between thin transition-metal films and sapphire, alumina or amorphous Al/sub 2/O/sub 3/ using backscattering spectrometry and x-ray diffraction. Thin films of Y, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, and Pt were deposited on the substrates by rf sputtering in an Ar gas ambient. The samples were subsequently annealed in vacuum at 800-900 C for 20 min to 4 h duration. It was found that only films of Y, Ti, and Hf react, regardless of the type of substrate, by forming aluminides near the substrate and oxides on the surface. The other metal films do not react with the Al/sub 2/O/sub 3/ substrates. Results agree with thermodynamic consideration based on the heats of reactions between metals and Al/sub 2/O/sub 3/.

• Research Organization: California Inst. of Tech., Pasadena (USA)
• OSTI ID: 5389680
• Report Number(s): AD-A-188604/3/XAB
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360105 -- Metals & Alloys-- Corrosion & Erosion
360205* -- Ceramics
Cermets
& Refractories-- Corrosion & Erosion
ALUMINIUM COMPOUNDS
ALUMINIUM OXIDES
BACKSCATTERING
CHALCOGENIDES
CHEMICAL REACTIONS
COATINGS
CORUNDUM
CRYSTALS
ELEMENTS
FILMS
KINETICS
METALS
MINERALS
OXIDE MINERALS
OXIDES
OXYGEN COMPOUNDS
REACTION KINETICS
SAPPHIRE
SCATTERING
SPUTTERING
SUBSTRATES
SURFACES
THIN FILMS
VAPOR DEPOSITED COATINGS