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Electron emission and structure properties of cesiated carbon films prepared by negative carbon ion beam

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.366077· OSTI ID:538428
;  [1]
  1. Department of Physics and Engineering Physics, Stevens Institute of Technology, Hoboken, New Jersey 07030 (United States)

The work function, field emission property (turn-on field), and Auger electron spectroscopy of cesiated carbon films on Si (100) have been investigated for codeposition of Cs neutral and C{sup {minus}} ion beams at different energies (25{endash}150 eV). The higher energy (150 eV) C{sup {minus}} ion beam produces the lower work function surface (1.1 eV) as well as sp{sup 3} rich carbon film. The work function depends both on cesium concentration as well as on the sp{sup 3} fraction in the carbon films. The turn-on field of the film can be as low as 7 V/{mu}m. The thermal stability of the low work function surface has been investigated for postdeposition annealing up to 600{degree}C. An extremely high stability cold cathode has been made by forming cesium carbide. {copyright} {ital 1997 American Institute of Physics.}

OSTI ID:
538428
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 5 Vol. 82; ISSN JAPIAU; ISSN 0021-8979
Country of Publication:
United States
Language:
English