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Title: Interactions of low energy reactive ions with surfaces. I. Dose and energy dependence of 3--300 eV C/sup +/, O/sup +/, and CO/sup +/ reactions with a Ni(111) surface

Journal Article · · J. Chem. Phys.; (United States)
OSTI ID:5372040

Reactions of C/sup +/, O/sup +/, and CO/sup +/ ions with a clean Ni(111) surface are studied as a function of both kinetic energy (E/sub k/) and ion dose for a range of chemically important energies (3--300 eV). An energy- and mass-selected, differentially pumped ion beam and ultrahigh vacuum spectrometer system which is designed to perform E/sub k/ dependence measurements of low-E/sub k/ ion--surface interactions is described. The Ni surface is exposed to low-E/sub k/ beams of these ions and concentrations of the resulting adspecies are monitored by Auger electron spectroscopy (AES) and x-ray and UV photoelectron spectroscopy (XPS and UPS). Reactions of C/sup +/ and O/sup +/ with Ni(111) yield nickel carbide (for monolayer doses) and oxide, respectively. These reactions are efficient at low E/sub k/; reaction probabilities P/sub r/ = 0.6--0.8 are observed for E/sub k/ <20 eV. P/sub r/ decreases slowly with increasing E/sub k/ until implantation of ions into the solid becomes significant. In the reaction of CO/sup +/ with Ni(111), the yield of molecular CO on the surface drops rapidly from 0.5 to below 0.1 in the range 3--10 eV. Collisional dissociation of CO/sup +/, which results in formation of surface NiC and NiO adspecies, increases with E/sub k/ and becomes the dominant process above 9 eV. Depth profile studies of the reacted surfaces indicate that implantation of C/sup +/ into subsurface Ni layers is more facile than implantation of O/sup +/ in the high energy portion of the range investigated. A Monte Carlo simulation of the atomic ion penetration into Ni has been carried out and the results are compared with experimental measurements.

Research Organization:
Department of Chemistry, University of Houston, Houston, Texas 77004
OSTI ID:
5372040
Journal Information:
J. Chem. Phys.; (United States), Vol. 88:9
Country of Publication:
United States
Language:
English

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