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Indium phosphide/cadmium sulfide thin-film solar cells. Final report, June 1980-June 1981

Technical Report ·
DOI:https://doi.org/10.2172/5356123· OSTI ID:5356123
Thin-films of InP were grown on recrystallized CdS (RXCdS) and InP by planar reactive deposition for the purpose of determining the factors which limit the development of InP/RXCdS thin-film solar cells. InP films were grown on RXCdS at substrate temperatures of 380/sup 0/C, 330/sup 0/C, and 280/sup 0/C; epitaxy of InP was achieved only at 280/sup 0/C. An InCdS transition layer is present at temperatures above 300/sup 0/C and may inhibit InP epitaxy. Be-doped films could not be made p-type on either RXCdS or semi-insulating (100) InP at a substrate temperature of 280/sup 0/C. P-type behavior was only occasionally obtained at 330/sup 0/C. At approximately 330/sup 0/C, MBE data shows a transition from a reconstructed surface at a higher temperature to an atomically smooth surface at a lower temperature. A change in surface kinetics at this temperature may alter the doping mechanism. Therefore, the electron concentration was examined as a function of the ratio of the phosphorus to indium fluxes for unintentionally doped films prepared on (100) semi-insulating InP substrates at 330/sup 0/C to alter the surface kinetics. No dependence of conductivity on deviations from stoichiometry was found. The growth of InP in a halide environment at reduced pressure is recommended as an alternative approach to enhance the growth of p-type InP at a lower substrate temperature. Growth of InP with PCl/sub 3/ was initiated at atmospheric pressure. Alternative device structures are presented which avoid the p-type doping problem.
Research Organization:
Hughes Research Labs., Malibu, CA (USA)
DOE Contract Number:
AC02-77CH00178
OSTI ID:
5356123
Report Number(s):
SERI/TR-9196-T2; ON: DE82003590
Country of Publication:
United States
Language:
English