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Product selectivity during CH/sub 2/OH decomposition on TiO/sub 2/ powders

Journal Article · · J. Phys. Chem.; (United States)
DOI:https://doi.org/10.1021/j100313a046· OSTI ID:5355367
The authors show that the product selectivity during the temperature-programmed decomposition of CH/sub 3/OH on TiO/sub 2/ is a strong function of the initial CH/sub 3/OH coverage. For low coverages, the dissociated CH/sub 3/OH protons react with residual HO/sub (a)/ groups on the TiO/sub 2/ surface, leading to the desorption of H/sub 2/O and leaving behind isolated CH/sub 3/O/sub (a)/ groups that are stable to 673 K. For higher coverages a range of additional products is observed, including recombined CH/sub 3/OH, CH/sub 3/OCH/sub 3/, and CH/sub 2/O below 673 K and CO, CO/sub 2/, and CH/sub 4/ at higher temperature. They propose a model in which the decomposition selectivity is determined by the coverage of neighboring HO/sub (a)/, CH/sub 3/O/sub (a), and O/sup 2 -///sub (a)/ species. In the case of HO/sub (a)/ species, evidence suggest that surface diffusion of protons from non-nearest-neighbor sites also affects the decomposition selectivity. The product selectivity is compared with that observed when CH/sub 3/OH decomposes on ZnO, and differences are discussed in terms of the relative strengths of HO/sub (a)/ and CH/sub 3/O/sub (a)/ bonds on the two surfaces
Research Organization:
Univ. of Minnesota, Minneapolis
OSTI ID:
5355367
Journal Information:
J. Phys. Chem.; (United States), Journal Name: J. Phys. Chem.; (United States) Vol. 92:2; ISSN JPCHA
Country of Publication:
United States
Language:
English